Total Copper Analyzer

Application

HMA-TCU: Precise Online Analysis of Total Copper in Industrial and Semiconductor Wastewater

Efficient Copper Analysis with State-of-the-Art Absorptiometry

The HMA-TCU is a powerful solution for companies requiring precise and continuous monitoring of total copper in industrial and technological wastewater. The device uses bathocuproin absorptiometry to make copper ions visible in a chemical reaction. During this process, a colored compound is formed, which the system then analyzes through a photometric measurement at 470 nm. As the device measures continuously, it ensures uninterrupted control of copper concentration and provides reliable data at all times.

Precise Measurements for Reliable Analysis Data

With a measuring range of 0.1 to 10 mg/L and a particularly fine resolution of 0.025 mg/L, the HMA-TCU detects even the smallest concentration fluctuations. Thanks to its automatic dilution function, the system flexibly adapts to various concentrations, ensuring all measurement results remain precise and consistent. This not only provides reliable analysis but also minimizes potential misinterpretations that could arise from inaccurate or inconsistent values.

Intelligent Automation for Minimal Maintenance Effort

By employing modern automation technologies, the HMA-TCU significantly reduces maintenance efforts. The automatic calibration ensures accurate measurements at all times, while the integrated sample filter prevents deposits and extends the device's lifespan. As the system consumes only very small amounts of reagents, a monthly change is sufficient, significantly reducing operating costs. Additionally, the optimized process control minimizes waste production to just 1.1 liters per month, allowing companies to benefit from a more environmentally friendly solution.

Versatile Applications – Ideal for Various Industries

Companies from different industries successfully use the HMA-TCU as it enables reliable copper monitoring. Precise control of copper concentration plays a crucial role, especially in metal processing and electroplating. The system is also regularly used in the chemical industry as it allows for accurate determination of copper compounds. In mining and ore processing, the device helps to precisely determine copper content in water. Furthermore, water treatment plants and environmental monitoring stations benefit from the accurate analysis to ensure high water quality in the long term.

In semiconductor manufacturing, the HMA-TCU represents an indispensable solution as it helps comply with strict requirements for copper concentration in process and wastewater. Even the smallest amounts of copper can lead to serious quality losses in microchip and wafer production. Therefore, the HMA-TCU ensures continuous monitoring, allowing companies to detect potential contaminations early and take targeted countermeasures.

Easy Integration into Existing Processes

The HMA-TCU impresses not only with its high measurement accuracy but also with its easy integration into existing systems. Thanks to the 4–20 mA DC analog output and digital communication interfaces, the device can be effortlessly incorporated into higher-level control systems. With its compact design measuring 600 × 255 × 900 mm, the analyzer easily fits even in confined production environments. This flexibility allows companies to implement quickly without requiring major restructuring.

Conclusion: Maximum Precision for Reliable Copper Monitoring

The HMA-TCU offers companies an efficient and precise way to reliably monitor copper concentration in industrial and semiconductor wastewater. Through state-of-the-art analysis technology, intelligent automation, and sustainable process management, the device represents a future-proof solution. Companies that place the highest demands on precision, efficiency, and environmental friendliness particularly benefit from the innovative technology of this system.